HIGH-FLUX OPERATION OF MICROSTRIP GAS CHAMBERS ON GLASS AND PLASTIC SUPPORTS

被引：45

作者：

BOUCLIER, R

FLORENT, JJ

GAUDAEN, J

MILLON, G

PASTA, A

ROPELEWSKI, L

SAULI, F

SHEKHTMAN, LI

机构：

[1] CERN, Geneva

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 1992年 / 323卷 / 1-2期

关键词：

D O I：

10.1016/0168-9002(92)90296-G

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Recent observations on microstrip gas chambers realized on various glass and plastic supports are presented in this paper. Short term measurements indicate a rate capability up to and above 5 x 10(5) counts/s mm2. A long term exposure to radiation shows however gain modifications, dependent on the resistivity of the chamber substrate; a choice of low resistivity supports minimizes this effect.

引用

页码：240 / 246

页数：7

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