A MECHANISM FOR SPUTTERED ATOMIC-ION AND CLUSTER-ION PRODUCTION

被引：2

作者：

AVAKOV, AS

PAZDZERSKY, VA

TSIPINYUK, BA

机构：

[1] Institute of Applied Physics, Tashkent State University, Tashkent

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1990年 / 48卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(90)90183-U

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Various channels of ionization within a collisional mechanism of secondary ion emission (SIE) from metals are considered by which secondary atomic- and cluster-ions are produced upon collision of two or more atoms, ejected by one primary ion near and far from a sputtered surface. In the framework of this model, for the example of two-atom collisions, the differences between some features of the emission of atomic- and dimer-ions of transition and noble metals are interpreted. © 1990.

引用

页码：562 / 565

页数：4

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