THE OPTICAL BANDGAP OF MULTILAYERS OF A-SI-H AND ALLOYS - A COMPARISON OF EXPERIMENT AND THIN-FILM OPTICS CALCULATIONS

被引:11
作者
BERNHARD, N [1 ]
DITTRICH, H [1 ]
BAUER, GH [1 ]
机构
[1] UNIV STUTTGART,ZENTRUM SONNENENERGIE & WASSERSTOFF FORSCH,W-7000 STUTTGART 80,GERMANY
关键词
D O I
10.1016/S0022-3093(05)80315-1
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The optical transmission of compositional multilayers of a-Si:H and alloys with Ge and C has been calculated using coherent multilayer thin-film optics. The optical bandgap in dependence on different electronic well and barrier widths was derived from the calculated spectra in the same way as from experimental ones. Si-SiGe and Si-SiC multilayers of about 1-mu-m total thickness and consisting of up to 400 periods were deposited by fast gas switching. Their periodicity was verified by X-ray scattering, and the optical gaps compared to those derived from calculated spectra. Observed shifts of the gap in calculations agree well with experimental values without taking into account a quantum size effect. Remaining differences may be explained by an interfacial transition layer between well and barrier of about 10 angstrom and/or a possible contribution to the shift due to redistribution of hydrogen in its bonding configuration. X-ray and IR data support the view that the width of the transition region is clearly more than the inter-atomic spacing.
引用
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页码:1103 / 1106
页数:4
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