ANISOTROPIC CRYSTAL ETCHING - A SIMULATION PROGRAM

被引：27

作者：

DANEL, JS

DELAPIERRE, G

机构：

[1] LETI, DOPT/SCMM-CEA-CENG 85X

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 1992年 / 31卷 / 1-3期

关键词：

D O I：

10.1016/0924-4247(92)80115-J

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In the field of micro-devices, tools are actually needed to model the fabrication processes, especially the shapes resulting from chemical etching of a monocrystal. This paper presents some results concerning the prediction of geometrical shapes obtained by this technique. The basic principles of a simulation program under development and some preliminary results are displayed.

引用

页码：267 / 274

页数：8

共 15 条

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[3]

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[4]

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[5]

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[6]

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[7]

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[8]

MANTYLA M, 1988, INTRO SOLID MODELING, P263

[9]

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[10]

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