DESIGN AND CHARACTERIZATION BY EXAFS, FTIR, AND TEM OF RH-SN/SIO2 CATALYSTS ACTIVE FOR NO-H-2 REACTION

被引:60
作者
TOMISHIGE, K [1 ]
ASAKURA, K [1 ]
IWASAWA, Y [1 ]
机构
[1] UNIV TOKYO,GRAD SCH SCI,DEPT CHEM,BUNKYO KU,TOKYO 113,JAPAN
关键词
D O I
10.1006/jcat.1994.1273
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Rh-Sn/SiO2 catalysts, prepared by the selective reaction between Sn (CH3)(4) and small Rh metallic particles supported on SiO2, showed much higher catalytic activities for NO-H-2 reaction and NO dissociation than Rh/SiO2 and coimpregnation Rh-Sn/SiO2. In order to examine the important factors for the efficient catalysis of the Rh-Sn/SiO2 catalysts, the samples were characterized by Sn K- and Rh K-edge EXAFS, FTIR, H-2 and CO adsorption, and TEM. For the Rh-Sn/SiO2 catalysts (Sn/Rh greater than or equal to 0.4), the surface concentration of Sn to Rh was estimated to be Sn-s/Rh-s 3, where a Rh atom is surrounded by six Sn atoms. According to the results of the Sn K-edge EXAFS analysis, the bond distance between a Sn atom and the nearest-neighbor atom in the first layer atoms was 0.270 nn, and the bond distance between a Sn atom and a metal atom in the second layer was 0.290 nm, suggesting a relaxation of the first bimetallic layer. A surface model structure of Rh-Sn particles on SiO2 as a catalytically active bimetallic ensemble is discussed. (C) 1994 Academic Press, Inc.
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页码:70 / 80
页数:11
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