THERMAL DESORPTION OF H, CO, AND CO2 FROM SILICON SURFACES

被引：7

作者：

BURTON, LC

机构：

来源：

关键词：

D O I：

10.1063/1.1660815

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：232 / &

共 7 条

[1] CLEANING OF SILICON SURFACES BY HEATING IN HIGH VACUUM [J].

ALLEN, FG ;

EISINGER, J ;

HAGSTRUM, HD ;

LAW, JT .

BURTON, LC ;

MADJID, AH .

PHYSICAL REVIEW, 1969, 185 (03) :1127-&

[3]

BURTON LC, TO BE PUBLISHED

[4] CARBON CONTAMINATION OF SI(111) SURFACES [J].

CHARIG, JM ;

SKINNER, DK .

[5] CARBIDE CONTAMINATION OF SILICON SURFACES [J].

HENDERSON, RC ;

MARCUS, RB ;

POLITO, WJ .

[6] ADSORPTION OF GASES ON A SILICON SURFACE [J].

LAW, JT ;

FRANCOIS, EE .

MILLER, DJ ;

HANEMAN, D .