VAPOR SOURCES FOR VACUUM DEPOSITION OF SUPERCONDUCTIVE THIN-FILM CIRCUITRY

被引：5

作者：

LEARN, AJ

SPRIGGS, RS

机构：

来源：

关键词：

D O I：

10.1063/1.1718296

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：179 / &

共 7 条

[1] EFFECT OF RESIDUAL GASES ON SUPERCONDUCTING CHARACTERISTICS OF TIN FILMS
CASWELL, HL
[J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (01) : 105 - &
[2] The beam shaping in the molecular flow.
Clausing, P.
[J]. ZEITSCHRIFT FUR PHYSIK, 1930, 66 (7-8): : 471 - 476
[3] HOLLAND L, 1958, VACUUM DEPOSITION TH, P143
[4] LEARN A, 1961, 98440003RU000 SPAC T
[5] LOEB L, 1961, KINETIC THEORY GASES, P310
[6] LOEB LB, 1961, KINETIC THEORY GASES, P95
[7] Tolansky S., 1949, MULTIPLE BEAM INTERF