REDUCTION IN MACROPARTICLES DURING THE DEPOSITION OF TIN FILMS PREPARED BY ARC ION PLATING

被引：61

作者：

AKARI, K ^{[1
]}

TAMAGAKI, H ^{[1
]}

KUMAKIRI, T ^{[1
]}

TSUJI, K ^{[1
]}

机构：

[1] TOKAI UNIV,DEPT MET & MAT SCI,1117 KITAKANAME,HIRATSUKA,KANAGAWA 25912,JAPAN

来源：

SURFACE & COATINGS TECHNOLOGY | 1990年 / 43-4卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(90)90084-P

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Preparation of films using the arc ion plating (AIP) process encounters a significant problem in that macroparticles are produced. To overcome this problem, the effect of a modified AIP source, characterized by the presence of a magnetic field on the plasma stream, has been investigated. The surface properties of TiN films were examined by varying the magnetic field strength and the pressure of nitrogen; quantitative measurements were made using an image analyser. It was found that the number of macroparticles could be reduced to 10% of that of the conventional process and that a high deposition rate, similar to that of the conventional process, could be achieved.

引用

页码：312 / 323

页数：12

共 20 条

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