NORMAL-STATE RESISTANCE FLUCTUATIONS IN HIGH-T-C CUPRATE FILMS

被引：28

作者：

LIU, L ^{[1
]}

ZHANG, K ^{[1
]}

JAEGER, HM ^{[1
]}

BUCHHOLZ, DB ^{[1
]}

CHANG, RPH ^{[1
]}

机构：

[1] NORTHWESTERN UNIV,DEPT MAT SCI & ENGN,EVANSTON,IL 60208

来源：

PHYSICAL REVIEW B | 1994年 / 49卷 / 05期

关键词：

D O I：

10.1103/PhysRevB.49.3679

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have measured l/f resistance fluctuations at room temperature in YBa2Cu3Ox films as a function of oxygen content, x. The films were single phase, c-axis oriented and grown by pulsed organometallic-beam epitaxy on LaAlO3 substrates. In contrast to the monotonic increase of the film resistance with decreasing x, the normalized noise power was found to exhibit a sharp minimum at x = 6.5. We attribute this behavior to vacancy creation in the Cu-O chains and discuss a simple model based on parallel conduction paths through both chains and planes.

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页码：3679 / 3682

页数：4

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