EFFECTS OF WATER PARTIAL-PRESSURE ON THE ACTIVATED ELECTRON-BEAM EVAPORATION PROCESS TO DEPOSIT TIN-DOPED INDIUM-OXIDE FILMS

被引：27

作者：

SHIGESATO, Y

YASUI, I

HAYASHI, Y

TAKAKI, S

OYAMA, T

KAMEI, M

机构：

[1] ASAHI GLASS CO LTD, RES CTR, KANAGAWA KU, YOKOHAMA 221, KANAGAWA, JAPAN

[2] SCI UNIV TOKYO, DEPT MAT SCI & TECHNOL, NODA, CHIBA 278, JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1995年 / 13卷 / 02期

关键词：

D O I：

10.1116/1.579409

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：268 / 275

页数：8

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