OPTICAL SPECTROSCOPY FOR DIAGNOSTICS AND PROCESS-CONTROL DURING GLOW-DISCHARGE ETCHING AND SPUTTER DEPOSITION

[1] Aston FW, 1907, P R SOC LOND A-CONTA, V79, P80, DOI 10.1098/rspa.1907.0016

[2] SPECTROSCOPIC MONITOR FOR SPUTTER-ETCHING PROCESSES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01): : 108 - 110

[3] CONCENTRATION PROFILES AND SPUTTERING YIELDS MEASURED BY OPTICAL RADIATION OF SPUTTERED PARTICLES [J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1976, 28 (1-2): : 77 - 83

[4] CLEMENTS RM, 1978, J VAC SCI TECHNOL, V15, P193, DOI 10.1116/1.569453

[5] Cobine JD, 1958, GASEOUS CONDUCTORS T, V1st, DOI DOI 10.1016/S0016-0032(42)90330-2

[6] ION-SURFACE INTERACTIONS IN PLASMA ETCHING [J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) : 3532 - 3540

[7] GLOW-DISCHARGE MASS-SPECTROMETRY - TECHNIQUE FOR DETERMINING ELEMENTAL COMPOSITION PROFILES IN SOLIDS [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (04) : 1779 - 1786

[8] ION ENERGIES AT CATHODE OF A GLOW DISCHARGE [J]. PHYSICAL REVIEW, 1963, 131 (01): : 219 - &

[9] SPECTROSCOPIC STUDY OF RADIOFREQUENCY OXYGEN PLASMA STRIPPING OF NEGATIVE PHOTORESISTS .1. ULTRAVIOLET-SPECTRUM [J]. APPLIED SPECTROSCOPY, 1976, 30 (05) : 520 - 527

[10] FRANCIS G, 1956, HDB PHYSIK, V22, P53

[1] Aston FW, 1907, P R SOC LOND A-CONTA, V79, P80, DOI 10.1098/rspa.1907.0016

[2] SPECTROSCOPIC MONITOR FOR SPUTTER-ETCHING PROCESSES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01): : 108 - 110

[3] CONCENTRATION PROFILES AND SPUTTERING YIELDS MEASURED BY OPTICAL RADIATION OF SPUTTERED PARTICLES [J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1976, 28 (1-2): : 77 - 83

[4] CLEMENTS RM, 1978, J VAC SCI TECHNOL, V15, P193, DOI 10.1116/1.569453

[5] Cobine JD, 1958, GASEOUS CONDUCTORS T, V1st, DOI DOI 10.1016/S0016-0032(42)90330-2

[6] ION-SURFACE INTERACTIONS IN PLASMA ETCHING [J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) : 3532 - 3540

[7] GLOW-DISCHARGE MASS-SPECTROMETRY - TECHNIQUE FOR DETERMINING ELEMENTAL COMPOSITION PROFILES IN SOLIDS [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (04) : 1779 - 1786

[8] ION ENERGIES AT CATHODE OF A GLOW DISCHARGE [J]. PHYSICAL REVIEW, 1963, 131 (01): : 219 - &

[9] SPECTROSCOPIC STUDY OF RADIOFREQUENCY OXYGEN PLASMA STRIPPING OF NEGATIVE PHOTORESISTS .1. ULTRAVIOLET-SPECTRUM [J]. APPLIED SPECTROSCOPY, 1976, 30 (05) : 520 - 527

[10] FRANCIS G, 1956, HDB PHYSIK, V22, P53