ION-SURFACE INTERACTIONS IN PLASMA ETCHING

被引：279

作者：

COBURN, JW ^{[1
]}

WINTERS, HF ^{[1
]}

CHUANG, TJ ^{[1
]}

机构：

[1] IBM CORP,RES LAB,SAN JOSE,CA 95193

来源：

JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 08期

关键词：

D O I：

10.1063/1.324150

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3532 / 3540

页数：9

共 24 条

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[3]

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[5]

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[6]

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