POSITIVE-ION BOMBARDMENT OF SUBSTRATES IN RF DIODE GLOW-DISCHARGE SPUTTERING

被引：430

作者：

COBURN, JW ^{[1
]}

KAY, E ^{[1
]}

机构：

[1] IBM CORP,RES LAB,SAN JOSE,CA 95114

来源：

JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 12期

关键词：

D O I：

10.1063/1.1661054

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4965 / 4971

页数：7

共 37 条

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[8] ENERGY ANOMALIES OBSERVED IN ION BEAMS PRODUCED BY RF SOURCES
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[9] REDUCED NICKEL CONCENTRATION IN A STAINLESS-STEEL DEPOSIT FROM BIAS SPUTTERING
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