RF BIASING THROUGH CAPACITIVE COLLECTOR TO TARGET COUPLING IN RF DIODE SPUTTERING

被引:12
作者
CHRISTENSEN, O
JENSEN, P
机构
来源
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS | 1972年 / 5卷 / 01期
关键词
D O I
10.1088/0022-3735/5/1/029
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:86 / +
页数:1
相关论文
共 9 条
[1]  
CHRISTENSEN O, 1970, SOLID STATE TECHNOL, V13, P39
[2]  
DAVIDSE PD, 1966, SOLID STATE TECHNOL, V13, P30
[3]   APPLICATION OF RF DISCHARGES TO SPUTTERING [J].
KOENIG, HR ;
MAISSEL, LI .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (02) :168-&
[5]   METAL EDGE COVERAGE AND CONTROL OF CHARGE ACCUMULATION IN RF SPUTTERED INSULATORS [J].
LOGAN, JS ;
MADDOCKS, FS ;
DAVIDSE, PD .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (02) :182-&
[6]   ELECTRICAL CHARACTERIZATION OF RADIO-FREQUENCY SPUTTERING GAS DISCHARGE [J].
LOGAN, JS ;
MAZZA, NM ;
DAVIDSE, PD .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01) :120-&
[7]  
SWIFT JD, 1970, ELECTRICAL PROBES PL
[8]  
VOSSEN JL, 1968, RCA REV, V29, P566
[9]   GAS INCORPORATION INTO SPUTTERED FILMS [J].
WINTERS, HF ;
KAY, E .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (10) :3928-&