STUDY OF OPTICAL EMISSION FROM AN RF PLASMA DURING SEMICONDUCTOR ETCHING

[1] DRY PROCESS TECHNOLOGY (REACTIVE ION ETCHING) [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (05): : 1023 - 1029

[2] CLARK HA, 1976, SOLID STATE TECHNOL, V19, P51

[3] SIMPLE OPTICAL-DEVICES FOR DETECTION OF RADIOFREQUENCY OXYGEN PLASMA STRIPPING OF PHOTORESISTS [J]. APPLIED SPECTROSCOPY, 1977, 31 (01) : 40 - 42

[4] SPECTROSCOPIC STUDY OF RADIOFREQUENCY OXYGEN PLASMA STRIPPING OF NEGATIVE PHOTORESISTS .1. ULTRAVIOLET-SPECTRUM [J]. APPLIED SPECTROSCOPY, 1976, 30 (05) : 520 - 527

[5] The arc spectra of fluorine and potassium Ka. [J]. ZEITSCHRIFT FUR PHYSIK, 1936, 98 (7-8): : 445 - 460

[6] FRITZINGER LB, 1976, COMMUNICATION

[7] REACTION OF O(2D-1(2)) ATOMS WITH CHLOROFLUOROMETHANES - FORMATION OF CIO [J]. CHEMICAL PHYSICS LETTERS, 1976, 37 (03) : 468 - 470

[8] Harrison G. R., 1969, MIT WAVELENGTH TABLE

[9] NEW CHEMICAL DRY ETCHING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1976, 15 : 13 - 18

[10] JACOB A, 1976, SOLID STATE TECHNOL, V19, P70

[1] DRY PROCESS TECHNOLOGY (REACTIVE ION ETCHING) [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (05): : 1023 - 1029

[2] CLARK HA, 1976, SOLID STATE TECHNOL, V19, P51

[3] SIMPLE OPTICAL-DEVICES FOR DETECTION OF RADIOFREQUENCY OXYGEN PLASMA STRIPPING OF PHOTORESISTS [J]. APPLIED SPECTROSCOPY, 1977, 31 (01) : 40 - 42

[4] SPECTROSCOPIC STUDY OF RADIOFREQUENCY OXYGEN PLASMA STRIPPING OF NEGATIVE PHOTORESISTS .1. ULTRAVIOLET-SPECTRUM [J]. APPLIED SPECTROSCOPY, 1976, 30 (05) : 520 - 527

[5] The arc spectra of fluorine and potassium Ka. [J]. ZEITSCHRIFT FUR PHYSIK, 1936, 98 (7-8): : 445 - 460

[6] FRITZINGER LB, 1976, COMMUNICATION

[7] REACTION OF O(2D-1(2)) ATOMS WITH CHLOROFLUOROMETHANES - FORMATION OF CIO [J]. CHEMICAL PHYSICS LETTERS, 1976, 37 (03) : 468 - 470

[8] Harrison G. R., 1969, MIT WAVELENGTH TABLE

[9] NEW CHEMICAL DRY ETCHING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1976, 15 : 13 - 18

[10] JACOB A, 1976, SOLID STATE TECHNOL, V19, P70