SPECTROSCOPIC MONITOR FOR SPUTTER-ETCHING PROCESSES

被引：9

作者：

BERNSTEIN, T ^{[1
]}

LABUDA, EF ^{[1
]}

机构：

[1] BELL TEL LABS INC, ALLENTOWN, PA 18103 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 01期

关键词：

D O I：

10.1116/1.1317916

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：108 / 110

页数：3

共 9 条

[1] A SYSTEM FOR DETERMINING MASS ENERGY OF PARTICLES INCIDENT ON A SUBSTRATE IN A PLANAR DIODE SPUTTERING SYSTEM [J].

COBURN, JW .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1970, 41 (08) :1219-&

[2]

DUDLEY RH, 1969 IEEE INT EL DEV

[3] SPUTTERING OF SURFACES BY POSITIVE ION BEAMS OF LOW ENERGY [J].

HONIG, RE .

JOURNAL OF APPLIED PHYSICS, 1958, 29 (03) :549-555

[4] EFFECTS OF A GUARDRING UPON LOW-ENERGY SPUTTERING YIELDS OF FLAT, SINGLE-CRYSTAL GOLD TARGETS [J].

KREYE, WC .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (09) :2897-&

[5] BEAM-LEAD TECHNOLOGY [J].

LEPSELTE.MP .

BELL SYSTEM TECHNICAL JOURNAL, 1966, 45 (02) :233-&

[6] METHOD FOR STUDYING SPUTTERED PARTICLES BY EMISSION SPECTROSCOPY [J].

SAWATZKY, E ;

KAY, E .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1966, 37 (10) :1324-&

[7] SPUTTERING YIELDS AT VERY LOW BOMBARDING ION ENERGIES [J].

STUART, RV ;

WEHNER, GK .

JOURNAL OF APPLIED PHYSICS, 1962, 33 (07) :2345-&

[8] ENERGY DISTRIBUTION OF SPUTTERED CU ATOMS [J].

STUART, RV ;

WEHNER, GK .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (06) :1819-&

[9] OPTICAL RADIATION FROM LOW-ENERGY ION-SURFACE COLLISIONS [J].

WHITE, CW ;

TOLK, NH .

PHYSICAL REVIEW LETTERS, 1971, 26 (09) :486-&

← 1 →