SYNTHESIS AND CHARACTERIZATION OF TITANIUM HYDRIDE THIN-FILMS OBTAINED BY REACTIVE CATHODIC SPUTTERING

被引：11

作者：

MEUNIER, G

MANAUD, JP

GRALL, P

机构：

[1] Laboratoire de Chimie du Solide, CNRS, 33405 Talence Cedex

来源：

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1993年 / 18卷 / 03期

关键词：

D O I：

10.1016/0921-5107(93)90147-F

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of titanium hydride were obtained by reactive cathodic sputtering with a titanium target using different compositions of a mixture of hydrogen and argon as sputtering gas. The layered material is quite different from the bulk material: only a poorly crystallized phase with formula TiH1.7 was synthesized at room temperature for all the gas mixtures investigated. The density measured by Rutherford backscattering spectrometry and X-ray absorption is slightly lower than that of the bulk hydride. These titanium hydride films can be used as a binding compound in metal-ceramic brazing.

引用

页码：303 / 307

页数：5

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