GROWTH AND MORPHOLOGY OF NI/CU(100) ULTRATHIN FILMS - AN IN-SITU STUDY USING SCANNING-TUNNELING-MICROSCOPY

被引:113
作者
SHEN, J
GIERGIEL, J
KIRSCHNER, J
机构
[1] Max-Planck-Institut für Mikrostrukturphysik, D-06120 Halle/Saale
来源
PHYSICAL REVIEW B | 1995年 / 52卷 / 11期
关键词
D O I
10.1103/PhysRevB.52.8454
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A scanning tunneling microscopy (STM) study is presented of the growth of Ni films on Cu(100). From a series of STM images taken of the same surface region during film growth, detailed information is gained on the film growth and morphology. Multilayer growth starts after nearly layer-by-layer growth of 3.5 layers, and becomes dominant above film thicknesses of 6 ML. Above 4 ML the islands are of rectangular shape, with their edges along [011] and [0 ($) over bar 11] directions. Annealing the film at a temperature of 450 K smooths the film surface without any significant substrate interdiffusion. Magnetooptical Kerr-effect measurements show the magnetization of a 10.2-ML film to remain perpendicular with a reduction less than 15% in amplitude, suggesting that the morphology is not responsible for the spin reorientation in this system.
引用
收藏
页码:8454 / 8460
页数:7
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