REACTIVE ION-BEAM ETCHING OF INP WITH N-2 AND N-2/O-2 MIXTURES

被引：29

作者：

KATZSCHNER, W ^{[1
]}

NIGGEBRUGGE, U ^{[1
]}

LOFFLER, R ^{[1
]}

SCHROTERJANSSEN, H ^{[1
]}

机构：

[1] NACHRICHTENTECH BERLIN GMBH,HEINRICH HERTZ INST,EINSTEINUFER 37,D-1000 BERLIN 10,FED REP GER

来源：

关键词：

D O I：

10.1063/1.96566

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：230 / 232

页数：3

共 12 条

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[9] SCHMIDT G, COMMUNICATION
[10] REACTIVE ION-BEAM ETCHING - DISSOCIATION OF MOLECULAR-IONS UPON IMPACT
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