PRACTICING THE NOVOLAC DEEP-UV PORTABLE CONFORMABLE MASKING TECHNIQUE

[1] BATCHELDER T, 1981, SEMICONDUCTOR IN APR, P213

[2] FATULA JJ, COMMUNICATION

[3] Franco J. R., 1977, US Patent, Patent No. 4004044

[4] GREENEICH JS, 1980, EL SOC EXT ABSTR, V80, P667

[5] COPOLYMERS OF METHYL-METHACRYLATE AND METHACRYLIC-ACID AND THEIR METAL-SALTS AS RADIATION SENSITIVE RESISTS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (01) : 154 - 161

[6] PMMA CO-POLYMERS AS HIGH-SENSITIVITY ELECTRON RESISTS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1984 - 1988

[7] HATZAKIS M, 1977, Patent No. 4024293

[8] HAVAS J, 1976, ELECTROCHEM SOC EXTE, V76, P743

[9] PARTIALLY COHERENT IMAGING IN 2 DIMENSIONS AND THE THEORETICAL LIMITS OF PROJECTION PRINTING IN MICROFABRICATION [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (05) : 931 - 938

[10] LIN BJ, 1978, IEEE T ELECTRON DEV, V25, P419

[1] BATCHELDER T, 1981, SEMICONDUCTOR IN APR, P213

[2] FATULA JJ, COMMUNICATION

[3] Franco J. R., 1977, US Patent, Patent No. 4004044

[4] GREENEICH JS, 1980, EL SOC EXT ABSTR, V80, P667

[5] COPOLYMERS OF METHYL-METHACRYLATE AND METHACRYLIC-ACID AND THEIR METAL-SALTS AS RADIATION SENSITIVE RESISTS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (01) : 154 - 161

[6] PMMA CO-POLYMERS AS HIGH-SENSITIVITY ELECTRON RESISTS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1984 - 1988

[7] HATZAKIS M, 1977, Patent No. 4024293

[8] HAVAS J, 1976, ELECTROCHEM SOC EXTE, V76, P743

[9] PARTIALLY COHERENT IMAGING IN 2 DIMENSIONS AND THE THEORETICAL LIMITS OF PROJECTION PRINTING IN MICROFABRICATION [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (05) : 931 - 938

[10] LIN BJ, 1978, IEEE T ELECTRON DEV, V25, P419