RESISTANCE OF PLANAR BARRIERS

被引:22
作者
LANDAUER, R
机构
[1] IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598
来源
PHYSICAL REVIEW B | 1995年 / 52卷 / 15期
关键词
D O I
10.1103/PhysRevB.52.11225
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The resistance of planar barriers is discussed for a variety of situations in which different sources of scattering act incoherently, allowing a semiclassical approach. This includes single barriers, a sequence of identical parallel barriers, and identical barriers at random angles simulating grain boundaries. Existing results are related, and only limited extension of these is provided. The case of a single barrier embedded in a uniformly resistive medium has been treated by Kunze and others. Kunze's analysis is validated and interpreted via a considerably simplified version of his model.
引用
收藏
页码:11225 / 11230
页数:6
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