EFFECT OF UNIAXIAL STRESS ON SILICON AND GERMANIUM

被引:2
作者
BULTHUIS, K
机构
关键词
D O I
10.1016/0375-9601(67)90016-3
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:512 / &
相关论文
共 15 条
[1]   INFLUENCE OF UNIAXIAL STRESS ON INDIRECT ABSORPTION EDGE IN SILICON AND GERMANIUM [J].
BALSLEV, I .
PHYSICAL REVIEW, 1966, 143 (02) :636-&
[2]   ANISOTROPIC STRESS EFFECT ON EXCESS CURRENT IN TUNNEL DIODES [J].
BERNARD, W ;
RINDNER, W ;
ROTH, H .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (06) :1860-&
[3]  
BULTHUIS K, 1965, PHILIPS RES REP, V20, P415
[4]   EFFECT OF LOCAL PRESSURE ON GERMANIUM P-N JUNCTIONS [J].
BULTHUIS, K .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (05) :2066-&
[5]  
BULTHUIS K, 1966, PHILIPS RES REP, V21, P85
[6]  
BULTHUIS K, TO BE PUBLISHED
[7]  
EDWARDS R, 1964, IEEE T ELECTRON DEVI, VED11, P286
[8]  
GOROFF I, 1963, PHYS REV, V132, P1080
[9]  
HENSEL JC, 1965, PHYS REV, VA138, P225
[10]   TRANSPORT AND DEFORMATION-POTENTIAL THEORY FOR MANY-VALLEY SEMICONDUCTORS WITH ANISOTROPIC SCATTERING [J].
HERRING, C ;
VOGT, E .
PHYSICAL REVIEW, 1956, 101 (03) :944-961