REACTIVE INTER-DIFFUSION AND ELECTRONIC BARRIERS AT METAL-CDS AND METAL-CDSE INTERFACES - CONTROL OF SCHOTTKY-BARRIER HEIGHT USING REACTIVE INTERLAYERS

被引：56

作者：

BRUCKER, CF

BRILLSON, LJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 03期

关键词：

D O I：

10.1116/1.571141

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：617 / 622

页数：6

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