MEASUREMENTS OF HYDROGEN IN METAL-OXIDE-SEMICONDUCTOR STRUCTURES USING NUCLEAR-REACTION PROFILING

被引：37

作者：

MARWICK, AD

YOUNG, DR

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 07期

关键词：

D O I：

10.1063/1.341043

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：2291 / 2298

页数：8

相关论文

共 30 条

[1] A NEW MEASUREMENT OF THE 429 KEV N-15(P,ALPHA-GAMMA) C-12 RESONANCE - APPLICATIONS OF THE VERY NARROW WIDTH FOUND TO N-15 AND H-1 DEPTH LOCATION .2. APPLICATIONS
AMSEL, G
COHEN, C
MAUREL, B
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1986, 14 (02) : 226 - 233
[2] BROWN DB, 1985, IEEE T NUCL SCI, V32, P3900
[3] Crank J., 1975, MATH DIFFUSION, V2nd
[4] AN IN-BEAM-LINE LOW-LEVEL SYSTEM FOR NUCLEAR-REACTION GAMMA-RAYS
DAMJANTSCHITSCH, H
WEISER, M
HEUSSER, G
KALBITZER, S
MANNSPERGER, H
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3): : 129 - 140
[5] CHARACTERISTICS OF FAST SURFACE STATES ASSOCIATED WITH SIO2-SI AND SI3N4-SIO2-SI STRUCTURES
DEAL, BE
MACKENNA, EL
CASTRO, PL
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 997 - &
[6] CURRENT-INDUCED HYDROGEN MIGRATION AND INTERFACE TRAP GENERATION IN ALUMINUM SILICON DIOXIDE SILICON CAPACITORS
FEIGL, FJ
GALE, R
CHEW, H
MAGEE, CW
YOUNG, DR
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1984, 1 (2-3) : 348 - 354
[7] HYDROGEN MIGRATION UNDER AVALANCHE INJECTION OF ELECTRONS IN SI METAL-OXIDE-SEMICONDUCTOR CAPACITORS
GALE, R
FEIGL, FJ
MAGEE, CW
YOUNG, DR
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) : 6938 - 6942
[8] EFFECTS OF PROCESSING ON HOT-ELECTRON TRAPPING IN SIO2
GDULA, RA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (01) : 42 - 47
[9] DIFFUSION OF RADIOLYTIC MOLECULAR-HYDROGEN AS A MECHANISM FOR THE POST-IRRADIATION BUILDUP OF INTERFACE STATES IN SIO2-ON-SI STRUCTURES
GRISCOM, DL
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (07) : 2524 - 2533
[10] IDENTIFICATION OF ELECTRON TRAPS IN THERMAL SILICON DIOXIDE FILMS
HARTSTEIN, A
YOUNG, DR
[J]. APPLIED PHYSICS LETTERS, 1981, 38 (08) : 631 - 633