SPACE-CHARGE-LIMITED CURRENT FLOW IN GALLIUM NITRIDE THIN-FILMS

被引:28
作者
VESELY, JC [1 ]
SHATZKES, M [1 ]
BURKHARDT, PJ [1 ]
机构
[1] IBM CORP, E FISHKILL TECHNOL LAB, SYST PROD DIV, HOPEWELL JUNCTION, NY 12533 USA
关键词
D O I
10.1103/PhysRevB.10.582
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:582 / 590
页数:9
相关论文
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