SPACE-CHARGE-LIMITED CURRENT FLOW IN GALLIUM NITRIDE THIN-FILMS

被引：28

作者：

VESELY, JC ^{[1
]}

SHATZKES, M ^{[1
]}

BURKHARDT, PJ ^{[1
]}

机构：

[1] IBM CORP, E FISHKILL TECHNOL LAB, SYST PROD DIV, HOPEWELL JUNCTION, NY 12533 USA

来源：

PHYSICAL REVIEW B | 1974年 / 10卷 / 02期

关键词：

D O I：

10.1103/PhysRevB.10.582

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：582 / 590

页数：9

共 32 条

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