EFFECT OF OXIDATION GASES ON THE FORMATION OF BI2SR2CUO6 THIN-FILMS

被引:19
作者
KANAI, M
HORIUCHI, K
KAWAI, T
KAWAI, S
机构
[1] Institute of Scientific and Industrial Research, Osaka University, Mihogaoka, Ibaraki
关键词
D O I
10.1063/1.104194
中图分类号
O59 [应用物理学];
学科分类号
摘要
Three kinds of oxidation gases, O2, N2O, and NO 2, have been used during the deposition of Bi2Sr 2CuO6 thin films, and the effect of the gases on the film formation has been compared. Ambient N2O with substrate irradiation by ArF excimer laser is effective for lowering the substrate temperature to form an as-grown film. The as-grown film formed in N2O, however, has a higher resistivity due to the lower oxygen concentration in the film. The mixed gas of N2O and O2 gives the best result. NO2 is very effective for film formation under low-pressure conditions, and makes it possible to form a crystallized as-grown film at such a low pressure of 1×10-4 Torr even in a conventional laser ablation experiment.
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页码:2716 / 2718
页数:3
相关论文
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