MOLECULAR-BEAM EPITAXY STUDY OF BI2SR2CUOX USING NO2 AS AN OXIDIZING-AGENT

被引：42

作者：

WATANABE, S

KAWAI, M

HANADA, T

机构：

[1] Research Laboratory of Engineering Materials, Tokyo Institute of Technology, Midori-ku, Tokyo, 227

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1990年 / 29卷 / 07期

关键词：

Bi[!sub]2[!/sub]sr[!sub]2[!/sub]cuo[!sub]x[!/sub; Mbe; No[!sub]2[!/sub; Srtio[!sub]3[!/sub](100);

D O I：

10.1143/JJAP.29.L1111

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Molecular beam epitaxy (MBE) of Bi2Sr2CuOx films has been studied using NO2 as an oxidizing agent. The in situ RHEED and the XPS observations have shown that a two-dimensional layer of the Bi2Sr2CuOx phase is formed on a SrTiO3(100) surface even at 300°C under 2×10-7 Torr of NO2. © 1990 The Japan Society of Applied Physics.

引用

页码：L1111 / L1113

页数：3

共 7 条

[1]

[Anonymous], 1977, ELEMENTS XRAY DIFFRA

[2] INSITU EPITAXIAL-GROWTH OF Y1BA2CU3O7-X FILMS BY MOLECULAR-BEAM EPITAXY WITH AN ACTIVATED OXYGEN SOURCE [J].

KWO, J ;

HONG, M ;

TREVOR, DJ ;

FLEMING, RM ;

WHITE, AE ;

FARROW, RC ;

KORTAN, AR ;

SHORT, KT .

APPLIED PHYSICS LETTERS, 1988, 53 (26) :2683-2685

[3] ROLE OF BOND LENGTHS IN THE 90-K SUPERCONDUCTOR - A NEUTRON POWDER-DIFFRACTION STUDY OF YBA2CU3-XCOXO7-Y [J].

MICELI, PF ;

TARASCON, JM ;

GREENE, LH ;

BARBOUX, P ;

ROTELLA, FJ ;

JORGENSEN, JD .

PHYSICAL REVIEW B, 1988, 37 (10) :5932-5935

[4] INSITU GROWTH OF BI-SR-CA-CU-O THIN-FILMS BY MOLECULAR-BEAM EPITAXY TECHNIQUE WITH PURE OZONE [J].

NAKAYAMA, Y ;

OCHIMIZU, H ;

MAEDA, A ;

KAWAZU, A ;

UCHINOKURA, K ;

TANAKA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1989, 28 (07) :L1217-L1219

[5] MOLECULAR-BEAM EPITAXY OF LAYERED DY-BA-CU-O COMPOUNDS [J].

SCHLOM, DG ;

ECKSTEIN, JN ;

HELLMAN, ES ;

STREIFFER, SK ;

HARRIS, JS ;

BEASLEY, MR ;

BRAVMAN, JC ;

GEBALLE, TH ;

WEBB, C ;

VONDESSONNECK, KE ;

TURNER, F .

APPLIED PHYSICS LETTERS, 1988, 53 (17) :1660-1662

[6]

SCHLOM DG, 1990, IN PRESS J CRYST GRO

[7] INSITU REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION OBSERVATION DURING GROWTH OF YBA2CU3O7-X THIN-FILMS BY ACTIVATED REACTIVE EVAPORATION [J].

TERASHIMA, T ;

IIJIMA, K ;

YAMAMOTO, K ;

HIRATA, K ;

BANDO, Y ;

TAKADA, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1989, 28 (06) :L987-L990

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