FORMATION AND DESORPTION OF ALUMINUM-HYDRIDE FROM HYDROGEN ADSORBED ALUMINUM SURFACES

被引：43

作者：

HARA, M

DOMEN, K

ONISHI, T

NOZOYE, H

NISHIHARA, C

KAISE, Y

SHINDO, H

机构：

[1] NATL CHEM LAB IND,1-1 HIGASHI,TSUKUBA,IBARAKI 305,JAPAN

[2] TOKYO INST TECHNOL,RESOURCES UTILIZAT RES LAB,MIDORI KU,YOKOHAMA,KANAGAWA 227,JAPAN

来源：

SURFACE SCIENCE | 1991年 / 242卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(91)90309-G

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Hydrogen adsorbed Al single crystal surfaces have been investigated under ultra-high vacuum by thermal desorption (TD) and X-ray photoelectron spectroscopy (XPS). The desorption of an aluminum hydride at 340 K was observed to be zero-order by TD experiments of an Al(111) surface on which hydrogen adsorbed at 150 K. This is a first observation of the desorption of a metal from a hydrogen adsorbed metal surface. XP spectra of Al2p for hydrogen adsorbed Al film on Mo(111) indicated that the precursor of the desorbed aluminum hydride, which desorbed as zero-order, was formed with an increase of the temperature of the Al film up to 340 K.

引用

页码：459 / 463

页数：5