ELECTRON-BEAM WRITING IN FABRICATING PLANAR HIGH-T(C) JOSEPHSON-JUNCTIONS

被引：22

作者：

TOLPYGO, S

NADGORNY, B

SHOKHOR, S

TAFURI, F

LIN, Y

BOURDILLON, A

GURVITCH, M

机构：

[1] SUNY STONY BROOK,DEPT MAT SCI,STONY BROOK,NY 11794

[2] UNIV NAPLES,DEPT PHYS,I-80125 NAPLES,ITALY

来源：

PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 1993年 / 209卷 / 1-3期

关键词：

D O I：

10.1016/0921-4534(93)90908-9

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Electron beam irradiation was utilized to fabricate planar Josephson junctions in Y1Ba2Cu3O7 thin films. After the micron-size bridges had been fabricated by way of standard optical lithography, they were modified using a well focused nanometer STEM probe with beam energy within the range of 80 - 120 keV. Modified junctions exhibit a two-step normal/superconductor transition. We attribute the lower transition temperature, which is of the order of 77 K, to the transition of the damaged region. Shapiro steps under applied microwave radiation of the frequency 10-15 GHz, as well as oscillation of the critical current in a magnetic field were observed up to 70 K. A comparison with the RSJ model is made and a possible damage mechanism is discussed.

引用

页码：211 / 214

页数：4

共 7 条

[1]

BARONE A, 1982, PHYSICS APPLICATIONS

[2]

GURVITCH M, 1991, MAY 3D FED WORKSH HI, P162

[3]

GURVITCH M, 1991, 3RD P INT WORKSH TUN

[4] NANOMETER-SCALE PATTERNING OF YBCO THIN-FILMS [J].

MACAULAY, JM ;

BAO, Z ;

BI, B ;

GURVITCH, M ;

HAN, S ;

LIN, JY ;

LUKENS, J ;

NADGORNY, B .

SUPERLATTICES AND MICROSTRUCTURES, 1992, 11 (02) :211-213

[5]

Pauza A. J., 1991, 3RD INT SUP EL C GLA, P352

[6] GROWTH OF EPITAXIAL BA2YCU3O7-X FILMS ON LAALO3(001) [J].

SIEGAL, MP ;

PHILLIPS, JM ;

HSIEH, YF ;

MARSHALL, JH .

PHYSICA C, 1990, 172 (3-4) :282-286

[7]

WEAVER BD, 1992, PHYS REV B, V46, P44

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