PLASMA FORMATION OF BUFFER LAYERS FOR MULTILAYER RESIST STRUCTURES

被引：13

作者：

DOBKIN, DM

CANTOS, BD

机构：

来源：

ELECTRON DEVICE LETTERS | 1981年 / 2卷 / 09期

关键词：

D O I：

10.1109/EDL.1981.25411

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：222 / 224

页数：3

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