INFLUENCE OF VARIOUS UNDERLAYERS ON THE SURFACE-ROUGHNESS OF EVAPORATED SILVER FILMS

被引：25

作者：

ORLOWSKI, R ^{[1
]}

URNER, P ^{[1
]}

HORNAUER, DL ^{[1
]}

机构：

[1] INST ANGEW PHYS,D-2000 HAMBURG 36,FED REP GER

来源：

SURFACE SCIENCE | 1979年 / 82卷 / 01期

关键词：

D O I：

10.1016/0039-6028(79)90318-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The surface roughness of silver films, 350 Å thick, deposited on well polished quartz substrates, is measured by means of surface plasmon excitation. The degree of roughness is changed by predeposited layers of silver. Supersmooth substrates are of influence on the angular distribution of the scattered light. Comparison is made with the surface roughness produced by LiF and CaF2 underlayers. © 1979.

引用

页码：69 / 78

页数：10

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