PROBING MATRIX-ISOLATED SIO MOLECULAR CLUSTERS BY X-RAY ABSORPTION-SPECTROSCOPY

被引:25
作者
FLANK, AM
KARNATAK, RC
BLANCARD, C
ESTEVA, JM
LAGARDE, P
CONNERADE, JP
机构
[1] UNIV PARIS 11,SPECT ATOM & ION LAB,F-91405 ORSAY,FRANCE
[2] UNIV LONDON IMPERIAL COLL SCI & TECHNOL,BLACKETT LAB,LONDON SW7 2AZ,ENGLAND
来源
ZEITSCHRIFT FUR PHYSIK D-ATOMS MOLECULES AND CLUSTERS | 1991年 / 21卷 / 04期
关键词
D O I
10.1007/BF01438409
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 [原子与分子物理]; 070304 [物理化学]; 081704 [应用化学]; 1406 [纳米科学与工程];
摘要
The K absorption edge of Si in matrix isolated SiO molecular clusters was studied for various dilutions R(Ar/SiO). The spectra from the clusters at different dilutions show a dramatic evolution in their relative intensity. Two types of spectral features from Si atoms present in the clusters could be detected in the spectra. The first is due to the Si atoms which are tetrahedrally coordinated to Si and O atoms responsible for the presence of different Si oxidation states. The Si+, Si3+ and Si4+ oxidation states in SiO clusters and in bulk were readily identified. The Si2+ oxidation state whose abundance in SiO clusters is predicted by structural considerations is not clearly observed. The second type of feature, whose intensity decreases with the dilution R, can be attributed to the presence of Si atoms possessing unsaturated bonds. In order to explain this the clustering of 4-6 SiO molecules is simulated to yield different tetrahedral bonding microstructures in which the well coordinated as well as under coordinated Si atoms are present. The behaviour of the spectral features resulting from these microstructures is discussed.
引用
收藏
页码:357 / 366
页数:10
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