IMPROVEMENT OF CRYSTALLOGRAPHIC AND ELECTROLUMINESCENT CHARACTERISTICS OF SRS-CE THIN-FILM DEVICES BY POSTDEPOSITION ANNEALING IN AR-S ATMOSPHERE

被引:21
作者
OHMI, K
FUJIMOTO, K
TANAKA, S
KOBAYASHI, H
机构
[1] Department of Electrical and Electronic Engineering, Tottori University, Koyama
关键词
D O I
10.1063/1.360621
中图分类号
O59 [应用物理学];
学科分类号
摘要
Post-deposition annealing in an Ar-S atmosphere at atmospheric pressure has been demonstrated to improve crystallographic properties and electroluminescent (EL) characteristics of SrS:Ce thin film EL devices. Crystallinity and degree of the orientation of the SrS:Ce thin films with polycrystalline columnar grains are improved by the annealing. It seems that recrystallization takes place between SrS grains. For the annealed devices, charge generation in the SrS:Ce layer is suppressed and relaxation of the phosphor field is decreased. As a result, an instantaneous EL efficiency at the leading edge emission is enhanced. The EL luminance and the average EL efficiency are increased. The annealed SrS:Ce thin-film EL device showed a luminance of 800 cd/m2 and an efficiency of 0.42 lm/W at 1 kHz drive. © 1995 American Institute of Physics.
引用
收藏
页码:428 / 434
页数:7
相关论文
共 24 条
[1]  
Barrow W., 1993, SID INT S, P761
[2]  
Barrow W. A., 1984, 1984 SID International Symposium. Digest of Technical Papers, P249
[3]  
HOSHINA T, 1980, J PHYS SOC JPN, V48, P158
[4]  
HUTTL B, 1993, 13TH P INT DISPL RES, P515
[5]  
LEPPANEN M, 1993, 13TH P INT DISP RES, P229
[6]   HIGH-EFFICIENCY SRS,SRSECECL3 BASED THIN-FILM ELECTROLUMINESCENT DEVICES [J].
MAUCH, RH ;
VELTHAUS, KO ;
BILGER, G ;
SCHOCK, HW .
JOURNAL OF CRYSTAL GROWTH, 1992, 117 (1-4) :964-968
[7]   CAPACITANCE-VOLTAGE CHARACTERISTICS OF ALTERNATING-CURRENT THIN-FILM ELECTROLUMINESCENT DEVICES [J].
MCARTHUR, RC ;
DAVIDSON, JD ;
WAGER, JF ;
KHORMAEI, I ;
KING, CN .
APPLIED PHYSICS LETTERS, 1990, 56 (19) :1889-1891
[8]   ZNSMN ELECTROLUMINESCENT THIN-FILMS PREPARED BY MULTISOURCE DEPOSITION UNDER CONTROLLED SULFUR VAPOR-PRESSURE [J].
NIRE, T ;
MATSUNO, A ;
MIYAKOSHI, A ;
OHMI, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (5A) :2605-2612
[9]  
NIRE T, 1989, 4TH P INT WORKSH EL, P218
[10]  
NIRE T, 1992, 1992 SID INT S SID B, P352