SPUTTERING OBSERVATIONS DURING BINARY ALLOY PRODUCTION BY ION-IMPLANTATION

被引：24

作者：

REYNOLDS, GW

KNUDSON, AR

GOSSETT, CR

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS | 1981年 / 182卷 / APR期

关键词：

Compendex;

D O I：

10.1016/0029-554X(81)90686-8

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

METALS AND ALLOYS

引用

页码：179 / 185

页数：7

共 16 条

[1] ANDERSON HH, 1980, SPUTTERING ION BOMBA, pCH4
[2] ANOMALOUSLY HIGH COLLECTION OF COPPER IONS IMPLANTED IN ALUMINIUM
ARMINEN, E
FONTELL, A
LINDROOS, VK
[J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1971, 4 (03): : 663 - &
[3] Biersack J. P., 1973, Radiation Effects, V19, P249, DOI 10.1080/00337577308232256
[4] CONCENTRATION PROFILES AND SPUTTERING YIELDS MEASURED BY OPTICAL RADIATION OF SPUTTERED PARTICLES
BRAUN, M
EMMOTH, B
BUCHTA, R
[J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1976, 28 (1-2): : 77 - 83
[5] CARTER G, 1979, RADIAT EFF LETT, V43, P125, DOI 10.1080/01422447908229237
[6] SPATIAL-DISTRIBUTION OF IONS IMPLANTED INTO SOLIDS SUBJECT TO DIFFUSION AND SURFACE SPUTTERING
COLLINS, R
CARTER, G
[J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1975, 26 (03): : 181 - 191
[7] GIBBONS JF, 1975, PROJECTED RANGE STAT
[8] METHOD FOR DETERMINING DEPTH PROFILES OF TRANSITION-ELEMENTS IN STEELS
GOSSETT, CR
[J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3): : 217 - 221
[9] HIRVONEN JK, 1980, TREATISE MATERIALS S
[10] MODEL CALCULATIONS OF PROFILES AND DOSE OF HIGH DOSE ION IMPLANTS INFLUENCED BY SPUTTERING
KRAUTLE, H
[J]. NUCLEAR INSTRUMENTS & METHODS, 1976, 134 (01): : 167 - 172