NEW TECHNIQUE FOR ELECTRON-TUNNELING JUNCTION FABRICATION AND ITS APPLICATION TO TANTALUM AND NIOBIUM

被引：46

作者：

KEITH, V ^{[1
]}

LESLIE, JD ^{[1
]}

机构：

[1] UNIV WATERLOO,DEPT PHYS,WATERLOO N2L 3G1,ONTARIO,CANADA

来源：

PHYSICAL REVIEW B | 1978年 / 18卷 / 09期

关键词：

D O I：

10.1103/PhysRevB.18.4739

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：4739 / 4761

页数：23

共 46 条

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