LIQUID-PHASE EPITAXY OF CUBIC FESI2 ON (111) SI INDUCED BY PULSED LASER IRRADIATION

被引:35
作者
GRIMALDI, MG
BAERI, P
SPINELLA, C
LAGOMARSINO, S
机构
[1] CNR,IST METODOL & TECNOL MICROELETTR,I-95129 CATANIA,ITALY
[2] CNR,IST ELETTR STATO SOLIDO,I-00156 ROME,ITALY
关键词
D O I
10.1063/1.106430
中图分类号
O59 [应用物理学];
学科分类号
摘要
Epitaxial beta-FeSi2 layers thermally grown on (111) Si substrates have been irradiated by 25 ns ruby laser pulses in the energy density range 0.3-0.7 J/cm2. Rutherford backscattering analyses in combination with the channeling effect have shown that the silicide stoichiometry does not change for irradiations up to an energy density of 0.5 J/cm2, while alignment of the irradiated silicide along the [111] substrate normal direction is observed. Transmission electron diffraction in the plan view configuration showed that this silicide phase has a cubic symmetry with a lattice parameter very similar to that of Si. Diffraction patterns taken along different poles of the substrate indicated that the epitaxial phase is 180-degrees rotated about the [111] normal direction like the B type NiSi2 and CoSi2 silicides.
引用
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页码:1132 / 1134
页数:3
相关论文
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