ION-BEAM MIXING AT NICKEL-SILICON INTERFACES

被引：73

作者：

AVERBACK, RS

THOMPSON, LJ

MOYLE, J

SCHALIT, M

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 03期

关键词：

D O I：

10.1063/1.330624

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1342 / 1349

页数：8

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