INFLUENCE OF INTERFACE STATES ON DYNAMIC TRANSCONDUCTANCE OF MIS-FETS

被引:5
作者
SCHRADER, L [1 ]
机构
[1] INST ANGEW PHYS,D-4400 MUNSTER,FED REP GER
关键词
D O I
10.1016/0038-1101(77)90042-9
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:671 / 674
页数:4
相关论文
共 14 条
[1]   GALLIUM ARSENIDE MOS TRANSISTORS [J].
BECKE, H ;
HALL, R ;
WHITE, J .
SOLID-STATE ELECTRONICS, 1965, 8 (10) :813-&
[3]   THEORY AND EXPERIMENTS ON SURFACE 1/F NOISE [J].
FU, HS ;
SAH, CT .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1972, ED19 (02) :273-+
[4]  
GOETZBERGER A, APPL SOLID ST SCI, V1, P178
[5]  
GOETZBERGER A, APPL SOLID ST SCI, V1, P180
[6]   INTERFACE STUDIES OF MOS-STRUCTURE BY TRANSFER-ADMITTANCE MEASUREMENTS [J].
KOOMEN, J .
SOLID-STATE ELECTRONICS, 1974, 17 (04) :321-328
[8]  
Nicollian E.H., 1967, BELL SYST TECH J, V46
[9]  
PAUL R, 1972, FELDEFFEKTTRANSISTOR, P110
[10]  
PAUL R, 1972, FELDEFFEKTTRANSISTOR, P107