HIGH-RESOLUTION, LOW-ENERGY BEAMS BY MEANS OF MIRROR OPTICS

被引:26
作者
MUNRO, E
ORLOFF, J
RUTHERFORD, R
WALLMARK, J
机构
[1] OREGON GRAD CTR,BEAVERTON,OR 97006
[2] RUTHERFORD CONSULTANT,NEW CANAAN,CT 06840
[3] IMAGE GRAPH INC,SHELTON,CT 06484
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期
关键词
D O I
10.1116/1.584147
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1971 / 1976
页数:6
相关论文
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[2]  
GRIVET P, 1972, ELECTRON OPTICS, V1, P97
[3]   A VARIABLE ENERGY FOCUSED ION-BEAM SYSTEM FOR INSITU MICROFABRICATION [J].
NARUM, DH ;
PEASE, RFW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (03) :966-973
[4]   Over some errors of electrons lenses. [J].
Scherzer, O. .
ZEITSCHRIFT FUR PHYSIK, 1936, 101 (05) :593-603
[5]  
SWANSON LW, 1984, ELECTRON OPTICAL SYS, P137