A VARIABLE ENERGY FOCUSED ION-BEAM SYSTEM FOR INSITU MICROFABRICATION

被引：49

作者：

NARUM, DH

PEASE, RFW

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.584289

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：966 / 973

页数：8

共 26 条

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[8] APPLICATION OF FOCUSED ION-BEAM TECHNOLOGY TO MASKLESS ION-IMPLANTATION IN A MOLECULAR-BEAM EPITAXY GROWN GAAS OR ALGAAS EPITAXIAL LAYER FOR 3-DIMENSIONAL PATTERN DOPING CRYSTAL-GROWTH
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[10] MUNRO E, 1975, ENG LABORATORY REPOR

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