2-STEP ANNEALING TECHNIQUE FOR LEAKAGE CURRENT REDUCTION IN CHEMICAL-VAPOR-DEPOSITED TA2O5 FILM

被引：46

作者：

SHINRIKI, H

NAKATA, M

NISHIOKA, Y

MUKAI, K

机构：

来源：

关键词：

D O I：

10.1109/55.43121

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：514 / 516

页数：3

共 8 条

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