ON THE PRIMARY PROCESS IN THE PLASMA-CHEMICAL AND PHOTOCHEMICAL VAPOR-DEPOSITION FROM SILANE .3. MECHANISM OF THE RADIATIVE SPECIES SI-STAR(1P) FORMATION

被引：48

作者：

TSUDA, M

OIKAWA, S

SATO, K

机构：

来源：

JOURNAL OF CHEMICAL PHYSICS | 1989年 / 91卷 / 11期

关键词：

D O I：

10.1063/1.457657

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：6822 / 6829

页数：8

共 19 条

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