OBSERVATION OF 2 LONG-LIVED MOLECULAR-STATES OF O-2 ON SI(111)7X7 AT ROOM-TEMPERATURE

被引:28
作者
COMTET, G [1 ]
DUJARDIN, G [1 ]
HELLNER, L [1 ]
HIRAYAMA, T [1 ]
ROSE, M [1 ]
PHILIPPE, L [1 ]
BESNARDRAMAGE, MJ [1 ]
机构
[1] UNIV PARIS 11, CNRS, PHOTOPHYS MOLEC LAB, F-91405 ORSAY, FRANCE
关键词
OXYGEN; SILICON; VISIBLE AND ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY;
D O I
10.1016/0039-6028(95)00080-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Adsorption of O-2 on Si(111)7 x 7 at room temperature is studied by photoemission. Low exposures of oxygen, from 0.1 to 10 langmuir, lead to the formation of two surface states, at 3.8 and 5.1 eV below the Fermi level. The state at 3.8 eV was previously assigned to molecular oxygen chemisorbed in the paul, para and grif configurations. The state at 5.1 eV can be assigned to a different adsorption configuration of molecular oxygen on Si(111)7 x 7. The lifetime of both states is the same within the experimental uncertainty. The lifetime of the 3.8 eV state is found to be of the order of 400 min, i.e. much longer than the previously measured lifetime.
引用
收藏
页码:370 / 374
页数:5
相关论文
共 17 条
  • [1] ATOM-RESOLVED SURFACE-CHEMISTRY - THE EARLY STEPS OF SI(111)-7X7 OXIDATION
    AVOURIS, P
    LYO, IW
    BOZSO, F
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02): : 424 - 430
  • [2] KINETICS OF OXYGEN DISSOCIATION ON SI(111)7X7 INVESTIGATED WITH OPTICAL 2ND-HARMONIC GENERATION
    BRATU, P
    KOMPA, KL
    HOFER, U
    [J]. PHYSICAL REVIEW B, 1994, 49 (19): : 14070 - 14073
  • [3] THEORETICAL AND EXPERIMENTAL INVESTIGATIONS OF THE ELECTRONIC-STRUCTURE OF OXYGEN ON SILICON
    CHEN, M
    BATRA, IP
    BRUNDLE, CR
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (05): : 1216 - 1220
  • [4] SITE-SPECIFIC AND STATE-SELECTIVE PHOTOFRAGMENTATION OF MOLECULAR-OXYGEN ON SI(111)-(7X7)
    DUJARDIN, G
    COMTET, G
    HELLNER, L
    HIRAYAMA, T
    ROSE, M
    PHILIPPE, L
    BESNARDRAMAGE, MJ
    [J]. PHYSICAL REVIEW LETTERS, 1994, 73 (12) : 1727 - 1730
  • [5] ENGEL T, 1993, SURF SCI REP, V18, P91, DOI 10.1016/0167-5729(93)90016-I
  • [6] ADSORPTION OF MOLECULAR-OXYGEN ON SI(111)
    HOFER, U
    PUSCHMANN, A
    COULMAN, D
    UMBACH, E
    [J]. SURFACE SCIENCE, 1989, 211 (1-3) : 948 - 958
  • [7] INITIAL-STAGES OF OXYGEN-ADSORPTION ON SI(111) .2. THE MOLECULAR PRECURSOR
    HOFER, U
    MORGEN, P
    WURTH, W
    UMBACH, E
    [J]. PHYSICAL REVIEW B, 1989, 40 (02): : 1130 - 1145
  • [8] METASTABLE MOLECULAR PRECURSOR FOR THE DISSOCIATIVE ADSORPTION OF OXYGEN ON SI(111)
    HOFER, U
    MORGEN, P
    WURTH, W
    UMBACH, E
    [J]. PHYSICAL REVIEW LETTERS, 1985, 55 (27) : 2979 - 2982
  • [9] VIBRATIONAL STUDY OF THE INITIAL-STAGES OF THE OXIDATION OF SI(111) AND SI(100) SURFACES
    IBACH, H
    BRUCHMANN, HD
    WAGNER, H
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1982, 29 (03): : 113 - 124
  • [10] OXIDATION OF CLEAN GE AND SI SURFACES
    LUDEKE, R
    KOMA, A
    [J]. PHYSICAL REVIEW LETTERS, 1975, 34 (18) : 1170 - 1173