OXIDATION OF CLEAN GE AND SI SURFACES

被引：119

作者：

LUDEKE, R ^{[1
]}

KOMA, A ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

PHYSICAL REVIEW LETTERS | 1975年 / 34卷 / 18期

关键词：

D O I：

10.1103/PhysRevLett.34.1170

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：1170 / 1173

页数：4

共 28 条

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