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TEMPERATURE-DEPENDENCE OF OXIDATION RATE IN CLEAN GE (111)
被引:35
作者
:
FRANTSUZOV, AA
论文数:
0
引用数:
0
h-index:
0
机构:
SEMICOND PHYS INST, NOVOSIBIRSK 6300090, USSR
SEMICOND PHYS INST, NOVOSIBIRSK 6300090, USSR
FRANTSUZOV, AA
[
1
]
MAKRUSHIN, NI
论文数:
0
引用数:
0
h-index:
0
机构:
SEMICOND PHYS INST, NOVOSIBIRSK 6300090, USSR
SEMICOND PHYS INST, NOVOSIBIRSK 6300090, USSR
MAKRUSHIN, NI
[
1
]
机构
:
[1]
SEMICOND PHYS INST, NOVOSIBIRSK 6300090, USSR
来源
:
SURFACE SCIENCE
|
1973年
/ 40卷
/ 02期
关键词
:
D O I
:
10.1016/0039-6028(73)90071-X
中图分类号
:
O64 [物理化学(理论化学)、化学物理学];
学科分类号
:
070304 ;
081704 ;
摘要
:
引用
收藏
页码:320 / 342
页数:23
相关论文
共 26 条
[1]
MEASUREMENT OF OXYGEN ADSORPTION ON SILICON BYELLIPSOMETRY
ARCHER, RJ
论文数:
0
引用数:
0
h-index:
0
ARCHER, RJ
GOBELI, GW
论文数:
0
引用数:
0
h-index:
0
GOBELI, GW
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1965,
26
(02)
: 343
-
&
[2]
ADSORPTION AND DESORPTION OF O2 ON GAAS [111] SURFACES
ARTHUR, JR
论文数:
0
引用数:
0
h-index:
0
ARTHUR, JR
[J].
JOURNAL OF APPLIED PHYSICS,
1967,
38
(10)
: 4023
-
+
[3]
BOONSTRA AH, 1968, PHILIPS RES REPT S3
[4]
BURTON W, 1965, PHILOS T R SOC A, V243, P199
[5]
INTERACTION OF N2 WITH (100) W
CLAVENNA, LR
论文数:
0
引用数:
0
h-index:
0
CLAVENNA, LR
SCHMIDT, LD
论文数:
0
引用数:
0
h-index:
0
SCHMIDT, LD
[J].
SURFACE SCIENCE,
1970,
22
(02)
: 365
-
+
[6]
ADSORPTION OF OXYGEN ON SILICON
EISINGER, J
论文数:
0
引用数:
0
h-index:
0
EISINGER, J
LAW, JT
论文数:
0
引用数:
0
h-index:
0
LAW, JT
[J].
JOURNAL OF CHEMICAL PHYSICS,
1959,
30
(02)
: 410
-
412
[7]
CHLORINE REACTIONS ON SI (111) SURFACE
FLORIO, JV
论文数:
0
引用数:
0
h-index:
0
机构:
Hammond Laboratory, Yale University, New Haven
FLORIO, JV
ROBERTSO.WD
论文数:
0
引用数:
0
h-index:
0
机构:
Hammond Laboratory, Yale University, New Haven
ROBERTSO.WD
[J].
SURFACE SCIENCE,
1969,
18
(02)
: 398
-
&
[8]
Frantsuzov A. A., 1971, Fizika i Tekhnika Poluprovodnikov, V5, P707
[9]
KINETICS AND MECHANISM OF OXYGEN ADSORPTION ON SINGLE CRYSTALS OF GERMANIUM
GREEN, M
论文数:
0
引用数:
0
h-index:
0
GREEN, M
LIBERMAN, A
论文数:
0
引用数:
0
h-index:
0
LIBERMAN, A
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1962,
23
(OCT)
: 1407
-
+
[10]
GREEN M, 1957, SEMICONDUCTOR SURFAC
←
1
2
3
→
共 26 条
[1]
MEASUREMENT OF OXYGEN ADSORPTION ON SILICON BYELLIPSOMETRY
ARCHER, RJ
论文数:
0
引用数:
0
h-index:
0
ARCHER, RJ
GOBELI, GW
论文数:
0
引用数:
0
h-index:
0
GOBELI, GW
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1965,
26
(02)
: 343
-
&
[2]
ADSORPTION AND DESORPTION OF O2 ON GAAS [111] SURFACES
ARTHUR, JR
论文数:
0
引用数:
0
h-index:
0
ARTHUR, JR
[J].
JOURNAL OF APPLIED PHYSICS,
1967,
38
(10)
: 4023
-
+
[3]
BOONSTRA AH, 1968, PHILIPS RES REPT S3
[4]
BURTON W, 1965, PHILOS T R SOC A, V243, P199
[5]
INTERACTION OF N2 WITH (100) W
CLAVENNA, LR
论文数:
0
引用数:
0
h-index:
0
CLAVENNA, LR
SCHMIDT, LD
论文数:
0
引用数:
0
h-index:
0
SCHMIDT, LD
[J].
SURFACE SCIENCE,
1970,
22
(02)
: 365
-
+
[6]
ADSORPTION OF OXYGEN ON SILICON
EISINGER, J
论文数:
0
引用数:
0
h-index:
0
EISINGER, J
LAW, JT
论文数:
0
引用数:
0
h-index:
0
LAW, JT
[J].
JOURNAL OF CHEMICAL PHYSICS,
1959,
30
(02)
: 410
-
412
[7]
CHLORINE REACTIONS ON SI (111) SURFACE
FLORIO, JV
论文数:
0
引用数:
0
h-index:
0
机构:
Hammond Laboratory, Yale University, New Haven
FLORIO, JV
ROBERTSO.WD
论文数:
0
引用数:
0
h-index:
0
机构:
Hammond Laboratory, Yale University, New Haven
ROBERTSO.WD
[J].
SURFACE SCIENCE,
1969,
18
(02)
: 398
-
&
[8]
Frantsuzov A. A., 1971, Fizika i Tekhnika Poluprovodnikov, V5, P707
[9]
KINETICS AND MECHANISM OF OXYGEN ADSORPTION ON SINGLE CRYSTALS OF GERMANIUM
GREEN, M
论文数:
0
引用数:
0
h-index:
0
GREEN, M
LIBERMAN, A
论文数:
0
引用数:
0
h-index:
0
LIBERMAN, A
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1962,
23
(OCT)
: 1407
-
+
[10]
GREEN M, 1957, SEMICONDUCTOR SURFAC
←
1
2
3
→