SPECULAR X-RAY REFLECTION FOR THE INSITU STUDY OF ELECTRODE SURFACES

被引：18

作者：

MELENDRES, CA ^{[1
]}

YOU, H ^{[1
]}

MARONI, VA ^{[1
]}

NAGY, Z ^{[1
]}

YUN, W ^{[1
]}

机构：

[1] ARGONNE NATL LAB,DIV ADV PHOTON SOURCE,ARGONNE,IL 60439

来源：

JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1991年 / 297卷 / 02期

关键词：

D O I：

10.1016/0022-0728(91)80051-Q

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

[No abstract available]

引用

页码：549 / 555

页数：7

共 10 条

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[2] BOSIO L, 1984, J ELECTROANAL CHEM, V180, P265, DOI 10.1016/0368-1874(84)83585-6
[3] X-RAY-SCATTERING STUDIES OF THIN-FILMS AND SURFACES - THERMAL OXIDES ON SILICON
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[6] CELL DESIGN FOR INSITU X-RAY-SCATTERING STUDY OF ELECTRODES IN TRANSMISSION GEOMETRY
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[J]. ELECTROCHIMICA ACTA, 1991, 36 (01) : 209 - 212
[7] Ocko B. M., 1990, NATO ASI SER, P343
[8] SURFACE STUDIES OF SOLIDS BY TOTAL REFLECTION OF X-RAYS
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[J]. PHYSICAL REVIEW, 1954, 95 (02): : 359 - 369
[9] X-RAY AND NEUTRON-SCATTERING FROM ROUGH SURFACES
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