X-RAY-SCATTERING STUDIES OF THIN-FILMS AND SURFACES - THERMAL OXIDES ON SILICON

被引：116

作者：

COWLEY, RA

RYAN, TW

机构：

来源：

关键词：

D O I：

10.1088/0022-3727/20/1/010

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：61 / 68

页数：8

共 13 条

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