INVESTIGATIONS ON HYDROPHILIC AND HYDROPHOBIC SILICON (100) WAFER SURFACES BY X-RAY PHOTOELECTRON AND HIGH-RESOLUTION ELECTRON-ENERGY LOSS-SPECTROSCOPY

被引：419

作者：

GRUNDNER, M

JACOB, H

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1986年 / 39卷 / 02期

关键词：

D O I：

10.1007/BF00616822

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

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页码：73 / 82

页数：10

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