ABSORPTION PROCESSES IN THE XECL LASER

被引：22

作者：

CHAMPAGNE, LF

PALUMBO, LJ

FINN, TG

机构：

[1] Laser Physics Branch, Naval Research Laboratory, Washington

来源：

APPLIED PHYSICS LETTERS | 1979年 / 34卷 / 05期

关键词：

D O I：

10.1063/1.90788

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Transient absorption in Ne/Xe/HCl mixtures and various rare gas combinations are measured. The observed results are matched with a numerical model to determine the dominant absorbing species in the XeCl laser. In pure neon plasmas Ne*2 is a dominant absorber. Addition of xenon greatly reduces this absorption through the mechanism of Penning ionization. Absorption is not changed by adding HCl to the optimum neon-xenon concentration.

引用

页码：315 / 318

页数：4

共 10 条

[1] INFLUENCE OF DILUENT GAS ON XEF LASER [J].