DEEP-UV PHOTORESISTS - POLY(METHYL METHACRYLATE-CO-INDENONE)

被引：23

作者：

HARTLESS, RL

CHANDROSS, EA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571271

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1333 / 1337

页数：5

共 10 条

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[8] THE EFFECT OF SENSITIZERS ON THE PHOTODEGRADATION OF POLY (METHYL METHACRYLATE-CO-3-OXIMINO-2-BUTANONE METHACRYLATE) [J].

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[10] PRELIMINARY EVALUATION OF CO-POLYMERS OF METHYL-METHACRYLATE AND ACYLOXIMINO METHACRYLATE AS DEEP UV RESISTS [J].

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CHANDROSS, EA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (11) :2510-2513

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